Facile one-step photopatterning of polystyrene films
نویسندگان
چکیده
The development of nanoand micropatterned materials is a key component of advanced nanotechnology. We report herein, a photo-based method for patterning general-purpose polymer films. Patterned ultraviolet (UV) light irradiation of a thin polystyrene film under controlled temperature generates surface relief structures by mass transfer from shaded to irradiated areas. The resulting surface relief structure can be arbitrarily erased by heating and reconstructed by patterned UV light irradiation, and this process is repeatable. This new method thus enables fabrication of dynamic reversible patterning structures from various general polymers. Polymer Journal (2012) 44, 966–972; doi:10.1038/pj.2012.40; published online 28 March 2012
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